Plasma Processing and Technology (E C E 528) Syllabus
Course Learning Outcomes
Course Learning Outcome
Specify or establish plasma properties over a wide parameter range.
Explain the concepts of thermionic emission, secondary emission, ionization, charge exchange, confinement, and stability.
Use a combination or resources (class text, class notes and literature) to solve problems.
Solve problems involving DC (hot cathode, magnetron, arc jet) and RF (capacitive, inductive, helicon, surface wave, arc jet) sources.
Solve problems and develop designs for systems involving plasma etching and thin and thick film deposition.
Write a paper based on literature survey of a particular plasma processing technique.
Plasma Processing and Technology
E C E 528
( 3 Credits )
Introduction to basic understanding and techniques. Plasma processing of materials for semiconductors, polymers, plasma spray coatings, ion implantation, etching, arcs, extractive metallurgy and welding. Plasma and materials diagnostics.
Physics 322 or ECE 320 or equiv or cons inst
Department: ELECTRICAL AND COMPUTER ENGR College: College of Engineering